top of page
What is Fluorine Plasma?
Fluorine plasma is a highly reactive gas discharge containing fluorine species, widely used for etching and cleaning applications. It excels at removing silicon-based materials and organic contaminants due to its strong chemical reactivity, making it a critical tool in semiconductor fabrication and precision cleaning.
Visit our detailed glossary section for plasma cleaning terms or visit our blog dedicated to sharing useful content related to plasma cleaning
bottom of page