What is sputtering?

Sputtering is the ejection of atoms from a surface struck by energetic ions. In plasma cleaning it is the physical component of the process, dislodging contamination and thin oxide layers by momentum transfer rather than chemical reaction, which is why inert gases such as argon are used for it. The same mechanism is exploited deliberately in sputter deposition, where the ejected atoms are collected on a nearby substrate to form a thin film.

Visit our detailed glossary section for plasma cleaning terms or visit our blog dedicated to sharing useful content related to plasma cleaning